Home/ Products / Glass Wafer / Fused Silica (PQ-JGS2)
Specification
Item Fused silica JGS2
Size 10*10mm、25*25mm、
50*50mm、100*100mm
Thickness 500±25μm、1000±25μm
Primary Flat Length N/A
Surface Finish S/D 60/40


Customization specifications:

* Various diameters:10~300mm .

* Ultra-thin wafers can be customized,thicknesses ≥0.1mm.

* Custom shapes available, including square windows or other forms for optical applications.


Properties
JGS2 Quartz
Material Medium-purity(natural or synthetic)
Main Composition SiO₂ (>99.9%)
Hydroxyl ~200 ppm
Thermal Expansion Coefficient 0.55 × 10⁻⁶/K
Heat Resistance softening point ~1700℃
Transmission Range 220–2500 nm
UV Transmission Poor (low transmittance <220 nm)
IR Transmission Good (high transmittance at 2.7 μm)
Chemical Stability Excellent
Mechanical Strength High
Main Applications IR optics, general optics, laser windows
SKU: --
10*10mm/ 25*25mm/50*50mm/100*100mm JGS2 Fused silica Wafer
Size
  • 10*10mm
  • 25*25mm
  • 50*50mm
  • 100*100mm
Thickness
  • 500±25μm
  • 1000±25μm
Pieces
  • 1pcs
  • 25pcs
  • 100pcs
Stock: 9999990
Quantity
$0.00 ~ 150.00

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DESCRIPTION
Optical‑grade JGS2 fused silica square substrate in standard sizes: 10×10 mm, 25×25 mm, 50×50 mm, 100×100 mm. Manufactured by oxy‑hydrogen melting high‑purity silica. Broad transmission 0.22 μm‑2.5 μm, ultra‑low thermal expansion, excellent thermal‑shock resistance and chemical inertness. Available in single‑side polished (SSP) or double‑side polished (DSP). Widely used for lab testing, MEMS prototypes, microfluidic chips, thin‑film deposition, UV‑Vis optics and sensor research. Custom thickness, edge chamfer and surface specs are supported.
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